Improving the return perfomance of Schottky diode with a security ring
Main Article Content
Abstract
Schottky diodes are used in many fields of electronics as pulse rectifier diodes. Manufacturing Schottky diode with a guard ring allows to significantly improve the protection of the metal-semiconductor transition from a possible flashover.
Existing methods of gettering structural defects and impurities in silicon typically do not fit into a particular technological path of manufacturing semiconductor devices and so are ineffective. In this connection it is appropriate to develop technological methods of gettering individual for each type of technological route of manufacturing a semiconductor device, taking into account its specific features.
This work is devoted to the study of design and technological features of making Schottky diode with guard ring and on the basis of the analysis of optimizing its manufacturing technology aimed at improving the diodes’ yield.
The developed technology makes it possible to significantly increase the breakdown voltage p-n transitions protective ring areas and significantly reduce reverse current Schottky diodes.
References 4, figures 3, tables 1.
Article Details
This work is licensed under a Creative Commons Attribution 4.0 International License.
Authors who publish with this journal agree to the following terms:- Authors retain copyright and grant the journal right of first publication with the work simultaneously licensed under a Creative Commons Attribution License that allows others to share the work with an acknowledgement of the work's authorship and initial publication in this journal.
- Authors are able to enter into separate, additional contractual arrangements for the non-exclusive distribution of the journal's published version of the work (e.g., post it to an institutional repository or publish it in a book), with an acknowledgement of its initial publication in this journal.
- Authors are permitted and encouraged to post their work online (e.g., in institutional repositories or on their website) prior to and during the submission process, as it can lead to productive exchanges, as well as earlier and greater citation of published work (See The Effect of Open Access).
References
Bogach N.V., Gusev V.A., Litovchenko P.G. (1981), “Gettering of packing defects and heavy metal impurities in silicon”. Semiconductor technology and microelectronics. Kiev, MY. 34. Pp. 3-20. (Rus)
Zi S. (1984), “Physics of Semiconductor Devices: In the 2 books. Book 1”. Mir, p. 456. (Rus)
Rayvi K. (1984), “Defects and impurities in semiconductor silicon”. Mir, p. 475. (Rus)
Roderick E. H. (1982), “Contacts metal-semiconductor”. M. Radio and communication, p.208. (Rus)