Photosensitive structures with porous silicon
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Abstract
The samples covered with porous silicon layer, achieved by the method of chemical etching, were investigated in this article. The spectral dependences of photosensitivity of the Al/porous-Si contact were achieved and compared with similar dependence for Al/c-Si contact. The analysis of achieved results have shown that photosensitivity in case of the samples of silicon layer is higher by a factor of ten and shortwave “tail” is observed on the spectral dependence. Integrated photosensitivity of the contact grows with increase of etching duration, until in approximately 1.5 minutes of etching it reaches saturation.
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