Photosensitive structures with porous silicon

Main Article Content

T. Yu. Bilyk
S. S. Shkarnikov

Abstract

The samples covered with porous silicon layer, achieved by the method of chemical etching, were investigated in this article. The spectral dependences of photosensitivity of the Al/porous-Si contact were achieved and compared with similar dependence for Al/c-Si contact. The analysis of achieved results have shown that photosensitivity in case of the samples of silicon layer is higher by a factor of ten and shortwave “tail” is observed on the spectral dependence. Integrated photosensitivity of the contact grows with increase of etching duration, until in approximately 1.5 minutes of etching it reaches saturation.

Article Details

How to Cite
Bilyk, T. Y., & Shkarnikov, S. S. (2012). Photosensitive structures with porous silicon. Electronics and Communications, 17(4), 11–13. https://doi.org/10.20535/2312-1807.2012.17.4.218984
Section
Solid-state electronics

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