Gas discharge electron beam vaporizer for deposition nanostructured coatings

Main Article Content

S.V. Denbnovetskyi
V.G. Melnyk
I.V. Melnyk
B.A. Tugai

Abstract

Possibilities of using of high voltage glow discharge electron guns for deposition of chemically complex coatings in controlled gas medium is considered. Arc discharge, lighted over the crucible with evaporated material, is used for ionizing of high-concentrated vapors. Dependences of additional discharge current from the electron beam power are analyzed. Microstructures of deposited films are investigated. Provided investigations show the high efficiency of using high voltage glow discharge electron guns for deposition of nanostructurized composite coatings

Article Details

How to Cite
Denbnovetskyi, S. ., Melnyk, V. ., Melnyk, I., & Tugai, B. . (2011). Gas discharge electron beam vaporizer for deposition nanostructured coatings. Electronics and Communications, 16(3), 64–67. https://doi.org/10.20535/2312-1807.2011.16.3.265029
Section
Vacuum, plasma and quantum electronics

References

Z. Schiller, U. Geisig, and Z. Panzer, Electron Beam Technology, Moscow: Energy, 1980, p. 528.

K. Goedicke, B. Scheffel, and S. Schiller, “Plasmaactivated high-rate electron beam evaporationusing a spotless cathodic”, Surface coatingand technology, no. 68/69, pp. 799–803, 1994

S. Denbnovetsky, V. Melnik, I. Melnik, and B. Tugai, “Development and application of gas-discharge electron-beam evaporators withcold cathode”, in VIII Internationalscientific and technical conference "Hightechnologies in Russian industry”, pp. 221–225.

M. Zavyalov, Y. Kreindel, A. Novikov, and L. Shanturin, Moscow: Atomizdat, 1989, p. 256.