Study of structural and optical properties of SnO2:F nanocrystalline films
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Abstract
Structural and optical investigation of tin oxide films properties was studied. The films were prepared from SnCl4 . 5H2O and NH4F using spray pyrolysis technique. Influence of the substrate temperature and fluorine concentration on resistances, mobility, carrier concentration and transmittance is discussed. High performance criterion of spray pyrolysis was received by optimization of regimes
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References
P. Mahawela, S. Jeedigunta, S. Vakkalanka, C. Ferekides, and D. Morel, “Transparent high-performance CDSE thin-film solar cells”, Thin Solid Films, vol. 480-481, pp. 466–470, Jun. 2005 DOI:10.1016/j.tsf.2004.11.066
U. Diebold, “The surface science of titanium dioxide”, Surface Science Reports, vol. 48, no. 5-8, pp. 53–229, Jan. 2003 DOI:10.1016/S0167-5729(02)00100-0
F. Gu, “Luminescent properties of Mn2+-doped SnO2 nanoparticles”, Inorganic Chemistry Communications, vol. 6, no. 7, pp. 882–885, Jul. 2003 DOI:10.1016/S1387-7003(03)00135-7
J. Lee, “Application of various surface passivationlayers in solar cells”, Journal of the Korean physicalsociety, vol. 45, no. 2, pp. 558–563, Jan. 2004.
E. Giani and R. Kelly, “A Study of SnO[sub 2] Thin Films Formed by Sputtering and by Anodizing”, Journal of The Electrochemical Society, vol. 121, no. 3, p. 394, Jan. 1974 DOI:10.1149/1.2401823
E. Domashevskaya, S. Ryabtsev, E. Tutov, Y. Yurakov, O. Chuvenkova, and A. Lukin, “Optical properties of SnO2-x nanolayers”, Letters to the Journal of Technical Physics, vol. 32, no. 18, pp. 7–12, 2006.
S. Samson and C. G. Fonstad, “Defect structure and electronic donor levels in stannic oxide crystals”, Journal of Applied Physics, vol. 44, no. 10, pp. 4618–4621, Oct. 1973 DOI:10.1063/1.1662011
A. Suikovskaya, Chemical methods semi-of thin transparent films, Leningrad: Khimiya, 1971, p. 198.
E. Elangovan and K. Ramamurthi, “A study on low cost-high conducting fluorine and antimony-doped tin oxide thin films”, Applied Surface Science, vol. 249, no. 1-4, pp. 183–196, Aug. 2005 DOI:10.1016/j.apsusc.2004.11.074
B. Thangaraju, “Structural and electrical studies on highly conducting spray deposited fluorine and antimony doped SnO2 thin films from SnCl2 precursor”, Thin Solid Films, vol. 402, no. 1-2, pp. 71–78, Jan. 2002 DOI:10.1016/S0040-6090(01)01667-4
S. Shanthi, C. Subramanian, and P. Ramasamy, “Growth and characterization of antimony doped tin oxide thin films”, Journal of Crystal Growth, vol. 197, no. 4, pp. 858–864, Mar. 1999 DOI:10.1016/S0022-0248(98)01066-5
E. Elangovan and K. Ramamurthi, “Optoelectronicproperties of spray deposited SnO2:F thin filmsfor window materials in solar sells”, Journal ofOptoelectronics and Advanced Materials, vol. 5, no. 1, pp. 45–54, Jan. 2003.
C. Geoffroy, G. Campet, F. Menil, J. Portier, J. Salardenne, and G. Couturier, “Optical and Electrical Properties of SnO :F Thin Films Obtained by R.F. Sputtering With Various Targets”, Active and Passive Electronic Components, vol. 14, no. 3, pp. 111–118, Jan. 1991 DOI:10.1155/1991/85965
V. Batavin, Y. Kontsevoy, and Y. Fedorovich, Measurement of semiconductor parameterskovy materials and structures, Moscow: Radio isvyaz, 1985, p. 264.
F. J. Yusta, M. L. Hitchman, and S. H. Shamlian, “CVD preparation and characterization of tin dioxide films for electrochemical applications”, Journal of Materials Chemistry, vol. 7, no. 8, pp. 1421–1427, Jan. 1997 DOI:10.1039/a608525c