Detailing localized levels of disorder semiconductor structures
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Abstract
The way for description the degree disorder active layers of semiconductor devices is displayed. By mean of the simplified representation for defective construction a lattice solidstate we is entered the functional dependence in energy spectrum, which giving local levels distribution for tail band gap. Possibility to explain the specific construction in amorphous matrix from technological modes of precipitation semiconductor layer is shown. We are offered the parameters that define scale of disarray in material.
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References
A. Sazonov, M. Meitin, D. Strahilev, and A. Nathan, “Low-temperature materials and thin-film transistors for electronics on flexible substrates”, Physics of semiconductors, vol. 40, no. 8, pp. 986–994, 2006.
J.-T. Lin and K.-D. Huang, “A High-Performance Polysilicon Thin-Film Transistor Built on a Trenched Body”, IEEE Transactions on Electron Devices, vol. 55, no. 9, pp. 2417–2422, Sep. 2008. DOI:10.1109/TED.2008.927667
J. Ziman, Models of Disorder, Moscow: Mir, 1982, p. 591.
M. Brodsky, Amorphous semiconductors, Moscow: Mir, 1982, p. 420.
O. Madelung, Solid State Physics. Localized States, Moscow: Nauka. Main Editorial Board of Physical and Mathematical Literature, 1985, p. 184.
S. Mitra, Physics of Structurally Disordered Solids, N. Y.: Plenum Press, 1976, p. 351.
S. Vonsovsky and M. Katsnelson, Quantum physics of solids, Moscow: Nauka, 1983, p. 336.
B. Ridley, Quantum processes in semiconductor, Oxford University Press, 1982, p. 302.
V. Bonch-Bruevich and S. Kalashnikov, Physics of semiconductors, vol. 3. Moscow: Science. Main editorial board of physical and mathematical literature, 1987, p. 679.
M. Bykov, A. Bykov, S. Zuev, A. Mazinov, N. Slipchenko, and D. Unzhakov, “Model of photogeneration and carrier transport in the a-Si:H/c-Si structure”, Applied Radioelectronics, no. 7, pp. 71–76, 2008.
A. Onishchuk and V. Panfilov, “Mechanism of thermal decomposition of silanes”, Uspekhi khimii, vol. 70, no. 4, pp. 368–379, 2001.
A. Mazinov, E. Lisovets, and A. Karavainikov, “Influence of hydrogen concentration in the magnetron chamber on the hydrogenation of silicon amorphous film”, Bulletin of SumSU, vol. 69, no. 10, pp. 101–106, 2004.



