Simulation of molecular beam deposition during evaporation from the crucible
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Abstract
In the frame of molecular mass-transfer model during evaporation from horizontal molted metal surface and wall surface of a crucible vapor source, boundary conditions are analytically defined and analytical expression for distributions of partial vapor flows in the space of their propagation together with deposited films parameters are obtained taking into account effects of constructive crucible parameters and type of substrate moving
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References
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A. Kuzmichev and L. Tsybulsky, “Simulation of film deposition during thermal vacuum evaporation from a crucible”, Electronika and connection, no. 2, pp. 78–82, 2009.
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