Radiation resistance of ohmic contacts to n-GaAs

Main Article Content

A.V. Ivashchuk

Abstract

Radiation firmness of ohmic contacts of unipolar transistors with the Schottky barrier on GaAs, made by two types of technology, is research in this work. The limit size of maximally possible dose of irradiation, which does not result in degradation of ohmic contacts parameters and its morphology, is defined. It is 2,58×104 Сl/kg, that on order higher, than transistors’ radiation firmness

Article Details

How to Cite
Ivashchuk, A. . (2010). Radiation resistance of ohmic contacts to n-GaAs. Electronics and Communications, 15(3), 46–48. https://doi.org/10.20535/2312-1807.2010.15.3.306024
Section
Solid-state electronics

References

Vdovin V.I., Grusha S.A., Konakova R.V., Milenin V.V., Naumovets A.A., Khazan L.S., Thorik Yu.A., “Ordered lateral inhomogeneity of the transition layer in the AuGe system –GaAs”, Letters to ZhTF, vol. 18, no. 16, pp. 10–13, 1992.

E.V. Kiseleva, M.A. Kitaev, S.V. Obolensky, V.T. Trofimov, and V.A. Kozlov, “Radiation resistance of promising arsenidesgallium field-effect transistors Schottky”, Journal of Technical Physics, vol. 75, no. 4, pp. 136–138, 2005.

A.E. Belyaev, J. Breza, E.F. Venger, M. Vesely, I.Yu. Il’in, R.V. Konakova, J. Liday, V.G. Lyapin, V.V. Milenin, I.V. Prokopenko, Yu.A. Tkhorik, Radiation resistance of GaAs-based microwave Schottky-barrier devices, Kiev: Interpress LTD, 1998, p. 128.

Method for manufacturing microwave transistors: A.s. No. 283284 USSR, MKI HOL, Sinishchuk I.K., Grusha S.A., Ivashchuk A.V., Application No. 3185961 dated 12.01.1987. Publ. 3.10.1988, Sat. RI. Instrumentation. No. 1, p. 31, DSK

Bosyy V.I., Ivashchuk A.V., Kovalchuk V.N., Ilyin I.Yu., Konakova R.V., Solovyov E.A., Stovpovoy M.A., Rengevich A.E., Tarielashvili G.T., “Field effect transistors with Schottky barrier”, St. Petersburg Journal of Electronics, vol. 22, no. 1, pp. 52–55, 2000.

A.V. Ivashchuk, “Thermal regimes of formation of ohmic contacts to gallium arsenide”, Electronic technology and design equipment, no. 5 – 6, pp. 43–45, 2000.

A.V. Ivashchuk, “Formation of ohmic contacts withsimultaneous cleaning of the arsenide surfacegallium and its doping with germanium atoms”, Scientific news of NTU KPI, no. 2, pp. 5–8, 2000.

V.S. Vavilov, A.E. Kyv, and O.R. Niyazova, Mechanisms of formation and migration of defects insemiconductors, Moscow: Nauka, 1981, p. 368.

Ivashchuk A.V., Burmaka V.A., Sinishchuk I.K., “Radiation resistance of ohmic contacts to n-GaAs”, SE, no. 6, pp. 47–49, Jan. 1989.

E.A. Bryantseva, V.V. Lopatin, and V.E. Lyubchenko, “Features of thin film coalescence Au-Ge when forming contacts of limited sizes”, FTT, vol. 30, no. 3, pp. 645–648, 1988.